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Akụkụ Seramiiki maka Ngwa Nnyocha Semiconductor
E ji igwe na-eme ka ihe dị n'ime seramiiki dị nro ma na-eme ka ọ dị ọcha n'okpuru okpomọkụ dị elu, wee jiri ya mee ihe nke ọma, akụkụ seramiiki ndị ahụ nwere ike imezu ihe achọrọ siri ike nke ngwaọrụ semiconductor, ya na atụmatụ ya dịka iguzogide iyi, iguzogide nchara, obere mgbasawanye okpomọkụ, na mkpuchi. Seramiiki nwere ike ịrụ ọrụ n'ọtụtụ ụdị ngwa mmepụta semiconductor nwere oke okpomọkụ, ikuku ma ọ bụ gas na-emebi emebi ruo ogologo oge.
Ejiri ntụ ntụ alumina dị ọcha mee ya, nke a na-eji ịpị isostatic oyi, imecha okpomọkụ dị elu na imecha ihe ziri ezi, ọ nwere ike iru nha nha ruo ±0.001 mm, imecha elu Ra 0.1, iguzogide okpomọkụ 1600℃.
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Efere Seramiiki Semiconductor Ngwaọrụ Ibu
E ji igwe na-eme ka ihe dị n'ime seramiiki dị nro ma na-eme ka ọ dị ọcha n'okpuru okpomọkụ dị elu, wee jiri ya mee ihe nke ọma, akụkụ seramiiki ndị ahụ nwere ike imezu ihe achọrọ siri ike nke ngwaọrụ semiconductor, ya na atụmatụ ya dịka iguzogide iyi, iguzogide nchara, obere mgbasawanye okpomọkụ, na mkpuchi. Seramiiki nwere ike ịrụ ọrụ n'ọtụtụ ụdị ngwa mmepụta semiconductor nwere oke okpomọkụ, ikuku ma ọ bụ gas na-emebi emebi ruo ogologo oge.
Ejiri ntụ ntụ alumina dị ọcha mee ya, nke a na-eji ịpị isostatic oyi, imecha okpomọkụ dị elu na imecha ihe ziri ezi, ọ nwere ike iru nha nha ruo ±0.001 mm, imecha elu Ra 0.1, iguzogide okpomọkụ 1600℃.
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Ngwa Semiconductor Akụkụ Seramiiki
E ji igwe na-eme ka ihe dị n'ime seramiiki dị nro ma na-eme ka ọ dị ọcha n'okpuru okpomọkụ dị elu, wee jiri ya mee ihe nke ọma, akụkụ seramiiki ndị ahụ nwere ike imezu ihe achọrọ siri ike nke ngwaọrụ semiconductor, ya na atụmatụ ya dịka iguzogide iyi, iguzogide nchara, obere mgbasawanye okpomọkụ, na mkpuchi. Seramiiki nwere ike ịrụ ọrụ n'ọtụtụ ụdị ngwa mmepụta semiconductor nwere oke okpomọkụ, ikuku ma ọ bụ gas na-emebi emebi ruo ogologo oge.
Ejiri ntụ ntụ alumina dị ọcha mee ya, nke a na-eji ịpị isostatic oyi, imecha okpomọkụ dị elu na imecha ihe ziri ezi, ọ nwere ike iru nha nha ruo ±0.001 mm, imecha elu Ra 0.1, iguzogide okpomọkụ 1600℃.
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Mgbaaka Akara Alumina nke Dị Ọcha Dị Elu maka Mmechi Ụlọ Okpomọkụ Dị Elu
Emebere mgbanaka seramiiki nke St.Cera dị ka ihe ọzọ maka mgbanaka O-mgbanaka polima n'ebe dị oke njọ ebe elastomers na-emebi emebi. Ejiri 99.8% alumina dị ọcha (Al₂O₃) rụọ mgbanaka akara siri ike a, a na-eji ya eme ihe n'ime ngwa mkpuchi static - nke a na-ejikọkarị ya na gasket metal ma ọ bụ graphite dị nro - iji nye oghere ikuku ma ọ bụ gas a pụrụ ịdabere na ya na okpomọkụ ruo 800°C na gburugburu plasma ma ọ bụ kemịkalụ siri ike. Ihe a na-enye enweghị gas na-apụ apụ, ike nrụgide dị elu (ike flexural dị n'okpuru 361 MPa), na enweghị ike kemịkalụ (na-eguzogide halogens, asịd, na alkalis ma e wezụga HF). Ebe mkpuchi a na-emechi emechi (ịdị larịị ≤5 μm, oke iru ala Ra ≤0.2 μm) na-eme ka ọ dị mfe ịnweta njikọ na ihe ndị mejupụtara ígwè ma ọ bụ seramiiki.
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Mgbaaka Lekwasị Anya nke Alumina Chamber dị Elu maka Plasma Etch & CVD Systems
Mgbaaka nchekwa ụlọ St.Cera bụ ihe dị mkpa eji arụ ọrụ dị mkpa na ngwa plasma etch, CVD, na PVD semiconductor. Ejiri 99.8% alumina dị ọcha (Al₂O₃) rụọ ya, mgbanaka ahụ gbara nsọtụ wafer gburugburu iji gbochie plasma ma melite nkesa ion n'akụkụ, si otú a na-eme ka nha nha etch dị n'elu wafer ahụ ka mma. Ihe a na-enye ike pụrụ iche nke plasma, ike dielectric dị elu (15×10⁶ V/m), na nkwụsi ike okpomọkụ ruo 1600°C, na-eme ka a pụrụ ịtụkwasị obi ogologo oge na gburugburu plasma dị ike nke fluorine ma ọ bụ chlorine. ID/OD na flatness (≤10 μm) na-eme ka nhazi akụkụ wafer ziri ezi, na-ebelata ntụpọ akụkụ na mmepụta ihe.
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Mgbaaka Ceramic Alumina Dị Ọcha Dị Elu Maka Ụlọ Usoro CVD / PVD
Emebere mgbanaka seramiiki nke St.Cera kpọmkwem maka iji ya na ụlọ ọrụ nhazi CVD (Chemical Vapor Deposition) na PVD (Physical Vapor Deposition). Ejiri 99.8% alumina dị ọcha (Al₂O₃) mepụta mgbanaka a, ọ na-eje ozi dị ka ihe mkpuchi ụlọ, mgbanaka lekwasịrị anya, ma ọ bụ ihe mejupụtara ngwa nhazi iji gbochie plasma ma chebe mgbidi ụlọ site na mbuze. Ihe a na-enye ezigbo iguzogide plasma, ike dielectric dị elu (15×10⁶ V/m), yana nkwụsi ike okpomọkụ ruo 1600°C, na-eme ka ndụ ogologo oge dị na gburugburu plasma dabere na fluorine dị ike. Ndozi nha ziri ezi (±0.05 mm na ID/OD) na ịdị larịị (≤10 μm) na-eme ka ọnọdụ akụkụ wafer na-aga n'ihu, na-eme ka nha nha nke ihe ndị dị n'ime ya dịkwuo mma ma na-ebelata mmepụta ihe ndị dị n'ime ya.
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Ihe na-eme ka ihe na-esi ísì ụtọ nke Bernoulli pụta — Njikwa Wafer na-anaghị emetụ aka maka Wafers dị gịrịgịrị na ndị na-adịghị ike
Ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe ghara imetụ aka. E ji ihe dị ọcha nke 99.8% alumina (Al₂O₃) ma ọ bụ silicon carbide (SiC) rụọ ya, o nwere ihe ndị e ji ígwè rụọ nke ọma nke na-ewepụta gas a rụnyere n'ọkụ iji mepụta ihe nkiri ikuku dị gịrịgịrị n'etiti ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe ghara imetụ aka. Ụkpụrụ a na-anaghị emetụ aka na-ewepụ mmetọ azụ, mgbawa n'akụkụ, na mmebi elu, na-eme ka ọ dị mma maka obere (≤100 μm), obere wafer, ma ọ bụ gbagọrọ agbagọ. Ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe na-eme ka ihe ghara imetụ aka nke ọma (361 MPa maka Al₂O₃; ruo 550–600 MPa maka SiC), obere oke, na nkwụsi ike dị mma, na-eme ka e nwee ike imegharị ya na robot ndị na-ebufe wafer ọsọ ọsọ.
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Akụkụ seramiiki Alumina dị ọcha nke ukwuu maka Semiconductor na ngwa ụlọ ọrụ mmepụta ihe
St.Cera na-emepụta akụkụ seramiiki alumina (Al₂O₃) nke e ji ígwè rụọ dịka nkọwa ndị ahịa si dị. Site na iji alumina dị ọcha nke 99.8%, ihe ndị a na-enye ike flexural dị mma (361 MPa), ike siri ike dị elu (16 GPa), na ike dielectric pụrụ iche (15 × 10⁶ V/m). Emebere ya maka ngwa semiconductor, mgbakọ ndị na-eguzogide iyi, ihe mkpuchi eletriki, na ihe ndozi okpomọkụ dị elu, ihe a na-enye mmiri fọrọ nke nta ka ọ bụrụ efu (0%) na oke mgbasawanye okpomọkụ nke 7.2 × 10⁻⁶/℃, na-eme ka akụkụ kwụsie ike n'okpuru ọnọdụ dị oke njọ.
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Porous seramiiki agụụ Chuck maka gbagọrọ agbagọ Wafer njikwa
E ji alumina dị ọcha nke ukwuu mepụta ihe mkpuchi seramiiki St.Cera nke nwere oghere dị larịị nke 30–45%, nha oghere dịkwa site na 10 ruo 100 μm. N'adịghị ka ihe mkpuchi nkịtị a na-akpọ gọlfụ, elu oghere ahụ na-enye oghere kesara n'akụkụ azụ wafer niile, na-ejide wafer ndị gbagọrọ agbagọ, dị gịrịgịrị, ma ọ bụ ndị a na-akpọ gọlfụ nke ọma na-enweghị ebuli ma ọ bụ gbajie n'akụkụ. Vacuum dị nro (nke a na-agbanwe site na ihe mgbochi) na-egbochikwa akara azụ.
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Alumina-Dabere na Porous seramiiki agụụ Chuck maka Thin Wafer Njikwa
E ji 99.6% Al₂O₃ dị ọcha nke e ji alumina rụọ chuck nke St.Cera, nke nwere oghere oghere a na-achịkwa nke 30–45%, yana nha oghere ahụ dị otu site na 10 ruo 50 μm. N'adịghị ka chucks ndị a gwuru agbaji, elu oghere ahụ na-enye oghere kesara n'akụkụ wafer dum, na-ewepụ akara n'akụkụ ma na-eme ka o kwe omume ijide obere ihe dị gịrịgịrị (≤100 μm) ma ọ bụ wafer ndị a gbagọrọ agbagọ. Ihe a na-enye ike flexural ≥250 MPa na nkwụsi ike okpomọkụ ruo 400°C n'ikuku.
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Efere nkesa gas alumina maka isi ịsa ahụ CVD/PVD
E ji seramiiki alumina dị ọcha nke 99.8% mee efere nkesa gas nke St.Cera (isi ịsa ahụ) nke ọma. O nwere ọtụtụ obere oghere (dayameta 0.3–1.5 mm) nke na-eme ka gas na-asọfe n'elu wafer n'oge usoro CVD, PVD, ma ọ bụ ALD. Ike dielectric dị elu nke efere ahụ (>15×10⁶ V/m) na iguzogide plasma na-eme ka ọ dị mkpa maka itinye ihe nkiri semiconductor dị gịrịgịrị.
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Ntụtụ Nkwado Seramiiki maka Ngwakọta Usoro Semiconductor
A na-eji ntụtụ seramiiki St.Cera (a makwaara dịka ntụtụ ebuli ma ọ bụ ntụtụ nkwado) eme ihe n'ime ụlọ ọrụ nhazi semiconductor iji bulie wafers ma ọ bụ substrates elu n'oge njikwa, ikpo ọkụ, ma ọ bụ oyi. Ejiri 99.8% alumina ma ọ bụ silicon nitride mepụta ntụtụ ndị a, ha na-enye ike nrụgide dị elu, nkwụsi ike okpomọkụ, na iguzogide kemịkalụ. Nhazi nke nsọtụ hemispherical ma ọ bụ dị larịị na-egbochi ịkpụcha wafer.
