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Nhazi ahaziri nke Al2O3 Efere Wafer Chuck
E ji igwe na-eme ka ihe dị n'ime seramiiki dị nro ma na-eme ka ọ dị ọcha n'okpuru okpomọkụ dị elu, wee jiri ya mee ihe nke ọma, akụkụ seramiiki ndị ahụ nwere ike imezu ihe achọrọ siri ike nke ngwaọrụ semiconductor, ya na atụmatụ ya dịka iguzogide iyi, iguzogide nchara, obere mgbasawanye okpomọkụ, na mkpuchi. Seramiiki nwere ike ịrụ ọrụ n'ọtụtụ ụdị ngwa mmepụta semiconductor nwere oke okpomọkụ, ikuku ma ọ bụ gas na-emebi emebi ruo ogologo oge.
Ejiri ntụ ntụ alumina dị ọcha mee ya, nke a na-eji ịpị isostatic oyi, imecha okpomọkụ dị elu na imecha ihe ziri ezi, ọ nwere ike iru nha nha ruo ±0.001 mm, imecha elu Ra 0.1, iguzogide okpomọkụ 1600℃.
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Ngwa Semiconductor ahaziri ahazi nke ST.CERA Efere seramiiki
E ji igwe na-eme ka ihe dị n'ime seramiiki dị nro ma na-eme ka ọ dị ọcha n'okpuru okpomọkụ dị elu, wee jiri ya mee ihe nke ọma, akụkụ seramiiki ndị ahụ nwere ike imezu ihe achọrọ siri ike nke ngwaọrụ semiconductor, ya na atụmatụ ya dịka iguzogide iyi, iguzogide nchara, obere mgbasawanye okpomọkụ, na mkpuchi. Seramiiki nwere ike ịrụ ọrụ n'ọtụtụ ụdị ngwa mmepụta semiconductor nwere oke okpomọkụ, ikuku ma ọ bụ gas na-emebi emebi ruo ogologo oge.
Ejiri ntụ ntụ alumina dị ọcha mee ya, nke a na-eji ịpị isostatic oyi, imecha okpomọkụ dị elu na imecha ihe ziri ezi, ọ nwere ike iru nha nha ruo ±0.001 mm, imecha elu Ra 0.1, iguzogide okpomọkụ 1600℃.
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Chuck Alumina Vacuum nke Inch 12 maka nhazi Wafer 300mm
E ji alumina dị ọcha nke dị sentimita iri na abụọ nke St.Cera mepụta ihe mkpuchi vacuum nke dị sentimita iri na abụọ site na 99.8% nke alumina dị elu (Al₂O₃) maka ijikwa wafer 300mm. Chuck ahụ nwere elu dị larịị (obosara oghere 0.5–1.0 mm, pitch 2–3 mm) iji hụ na ekesara oghere ahụ n'otu nha n'obosara 300mm dum. A na-ejigide ịdị larịị n'ime 5 μm, na-eme ka a na-etinye wafer na-enweghị warp n'oge ịkpụ, ịkpụ azụ, na inyocha ya. Ike flexural dị elu nke ihe ahụ (361 MPa) na ike siri ike (16 GPa) na-ekwe nkwa nkwụsi ike ogologo oge ọbụlagodi n'okpuru usoro vacuum ugboro ugboro.
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Akụkụ Seramiiki maka Ngwa Nnyocha Semiconductor
E ji igwe na-eme ka ihe dị n'ime seramiiki dị nro ma na-eme ka ọ dị ọcha n'okpuru okpomọkụ dị elu, wee jiri ya mee ihe nke ọma, akụkụ seramiiki ndị ahụ nwere ike imezu ihe achọrọ siri ike nke ngwaọrụ semiconductor, ya na atụmatụ ya dịka iguzogide iyi, iguzogide nchara, obere mgbasawanye okpomọkụ, na mkpuchi. Seramiiki nwere ike ịrụ ọrụ n'ọtụtụ ụdị ngwa mmepụta semiconductor nwere oke okpomọkụ, ikuku ma ọ bụ gas na-emebi emebi ruo ogologo oge.
Ejiri ntụ ntụ alumina dị ọcha mee ya, nke a na-eji ịpị isostatic oyi, imecha okpomọkụ dị elu na imecha ihe ziri ezi, ọ nwere ike iru nha nha ruo ±0.001 mm, imecha elu Ra 0.1, iguzogide okpomọkụ 1600℃.
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Efere Seramiiki Semiconductor Ngwaọrụ Ibu
E ji igwe na-eme ka ihe dị n'ime seramiiki dị nro ma na-eme ka ọ dị ọcha n'okpuru okpomọkụ dị elu, wee jiri ya mee ihe nke ọma, akụkụ seramiiki ndị ahụ nwere ike imezu ihe achọrọ siri ike nke ngwaọrụ semiconductor, ya na atụmatụ ya dịka iguzogide iyi, iguzogide nchara, obere mgbasawanye okpomọkụ, na mkpuchi. Seramiiki nwere ike ịrụ ọrụ n'ọtụtụ ụdị ngwa mmepụta semiconductor nwere oke okpomọkụ, ikuku ma ọ bụ gas na-emebi emebi ruo ogologo oge.
Ejiri ntụ ntụ alumina dị ọcha mee ya, nke a na-eji ịpị isostatic oyi, imecha okpomọkụ dị elu na imecha ihe ziri ezi, ọ nwere ike iru nha nha ruo ±0.001 mm, imecha elu Ra 0.1, iguzogide okpomọkụ 1600℃.
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Ngwa Semiconductor Akụkụ Seramiiki
E ji igwe na-eme ka ihe dị n'ime seramiiki dị nro ma na-eme ka ọ dị ọcha n'okpuru okpomọkụ dị elu, wee jiri ya mee ihe nke ọma, akụkụ seramiiki ndị ahụ nwere ike imezu ihe achọrọ siri ike nke ngwaọrụ semiconductor, ya na atụmatụ ya dịka iguzogide iyi, iguzogide nchara, obere mgbasawanye okpomọkụ, na mkpuchi. Seramiiki nwere ike ịrụ ọrụ n'ọtụtụ ụdị ngwa mmepụta semiconductor nwere oke okpomọkụ, ikuku ma ọ bụ gas na-emebi emebi ruo ogologo oge.
Ejiri ntụ ntụ alumina dị ọcha mee ya, nke a na-eji ịpị isostatic oyi, imecha okpomọkụ dị elu na imecha ihe ziri ezi, ọ nwere ike iru nha nha ruo ±0.001 mm, imecha elu Ra 0.1, iguzogide okpomọkụ 1600℃.
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Mgbaaka Akara Alumina nke Dị Ọcha Dị Elu maka Mmechi Ụlọ Okpomọkụ Dị Elu
Emebere mgbanaka seramiiki nke St.Cera dị ka ihe ọzọ maka mgbanaka O-mgbanaka polima n'ebe dị oke njọ ebe elastomers na-emebi emebi. Ejiri 99.8% alumina dị ọcha (Al₂O₃) rụọ mgbanaka akara siri ike a, a na-eji ya eme ihe n'ime ngwa mkpuchi static - nke a na-ejikọkarị ya na gasket metal ma ọ bụ graphite dị nro - iji nye oghere ikuku ma ọ bụ gas a pụrụ ịdabere na ya na okpomọkụ ruo 800°C na gburugburu plasma ma ọ bụ kemịkalụ siri ike. Ihe a na-enye enweghị gas na-apụ apụ, ike nrụgide dị elu (ike flexural dị n'okpuru 361 MPa), na enweghị ike kemịkalụ (na-eguzogide halogens, asịd, na alkalis ma e wezụga HF). Ebe mkpuchi a na-emechi emechi (ịdị larịị ≤5 μm, oke iru ala Ra ≤0.2 μm) na-eme ka ọ dị mfe ịnweta njikọ na ihe ndị mejupụtara ígwè ma ọ bụ seramiiki.
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Mgbaaka Lekwasị Anya nke Alumina Chamber dị Elu maka Plasma Etch & CVD Systems
Mgbaaka nchekwa ụlọ St.Cera bụ ihe dị mkpa eji arụ ọrụ dị mkpa na ngwa plasma etch, CVD, na PVD semiconductor. Ejiri 99.8% alumina dị ọcha (Al₂O₃) rụọ ya, mgbanaka ahụ gbara nsọtụ wafer gburugburu iji gbochie plasma ma melite nkesa ion n'akụkụ, si otú a na-eme ka nha nha etch dị n'elu wafer ahụ ka mma. Ihe a na-enye ike pụrụ iche nke plasma, ike dielectric dị elu (15×10⁶ V/m), na nkwụsi ike okpomọkụ ruo 1600°C, na-eme ka a pụrụ ịtụkwasị obi ogologo oge na gburugburu plasma dị ike nke fluorine ma ọ bụ chlorine. ID/OD na flatness (≤10 μm) na-eme ka nhazi akụkụ wafer ziri ezi, na-ebelata ntụpọ akụkụ na mmepụta ihe.
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Mgbaaka Ceramic Alumina Dị Ọcha Dị Elu Maka Ụlọ Usoro CVD / PVD
Emebere mgbanaka seramiiki nke St.Cera kpọmkwem maka iji ya na ụlọ ọrụ nhazi CVD (Chemical Vapor Deposition) na PVD (Physical Vapor Deposition). Ejiri 99.8% alumina dị ọcha (Al₂O₃) mepụta mgbanaka a, ọ na-eje ozi dị ka ihe mkpuchi ụlọ, mgbanaka lekwasịrị anya, ma ọ bụ ihe mejupụtara ngwa nhazi iji gbochie plasma ma chebe mgbidi ụlọ site na mbuze. Ihe a na-enye ezigbo iguzogide plasma, ike dielectric dị elu (15×10⁶ V/m), yana nkwụsi ike okpomọkụ ruo 1600°C, na-eme ka ndụ ogologo oge dị na gburugburu plasma dabere na fluorine dị ike. Ndozi nha ziri ezi (±0.05 mm na ID/OD) na ịdị larịị (≤10 μm) na-eme ka ọnọdụ akụkụ wafer na-aga n'ihu, na-eme ka nha nha nke ihe ndị dị n'ime ya dịkwuo mma ma na-ebelata mmepụta ihe ndị dị n'ime ya.
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Porous seramiiki agụụ Chuck maka gbagọrọ agbagọ Wafer njikwa
E ji alumina dị ọcha nke ukwuu mepụta ihe mkpuchi seramiiki St.Cera nke nwere oghere dị larịị nke 30–45%, nha oghere dịkwa site na 10 ruo 100 μm. N'adịghị ka ihe mkpuchi nkịtị a na-akpọ gọlfụ, elu oghere ahụ na-enye oghere kesara n'akụkụ azụ wafer niile, na-ejide wafer ndị gbagọrọ agbagọ, dị gịrịgịrị, ma ọ bụ ndị a na-akpọ gọlfụ nke ọma na-enweghị ebuli ma ọ bụ gbajie n'akụkụ. Vacuum dị nro (nke a na-agbanwe site na ihe mgbochi) na-egbochikwa akara azụ.
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Alumina-Dabere na Porous seramiiki agụụ Chuck maka Thin Wafer Njikwa
E ji 99.6% Al₂O₃ dị ọcha nke e ji alumina rụọ chuck nke St.Cera, nke nwere oghere oghere a na-achịkwa nke 30–45%, yana nha oghere ahụ dị otu site na 10 ruo 50 μm. N'adịghị ka chucks ndị a gwuru agbaji, elu oghere ahụ na-enye oghere kesara n'akụkụ wafer dum, na-ewepụ akara n'akụkụ ma na-eme ka o kwe omume ijide obere ihe dị gịrịgịrị (≤100 μm) ma ọ bụ wafer ndị a gbagọrọ agbagọ. Ihe a na-enye ike flexural ≥250 MPa na nkwụsi ike okpomọkụ ruo 400°C n'ikuku.
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Efere nkesa gas alumina maka isi ịsa ahụ CVD/PVD
E ji seramiiki alumina dị ọcha nke 99.8% mee efere nkesa gas nke St.Cera (isi ịsa ahụ) nke ọma. O nwere ọtụtụ obere oghere (dayameta 0.3–1.5 mm) nke na-eme ka gas na-asọfe n'elu wafer n'oge usoro CVD, PVD, ma ọ bụ ALD. Ike dielectric dị elu nke efere ahụ (>15×10⁶ V/m) na iguzogide plasma na-eme ka ọ dị mkpa maka itinye ihe nkiri semiconductor dị gịrịgịrị.
